Positron Beam Systems
First Point Scientific, Inc. (FPSI) is currently developing a positron beam system based on a novel trap-based approach for applications in material surface analysis.
System Description: Positrons
are accumulated from a radioactive source in a Penning trap, manipulated to
enhance beam parameters, and then released to produce a high quality positron
beam. Novel capabilities include high efficiency brightness enhancement, beam
bunching, and the production of ultra cold positron beams. A picture of the
positron beam generation system and one of the traps are shown below.
Slow positron flux: 1—10 million/sec. Pulse widths <200 ps. Positron beams
with diameters of <1 micron can potentially be produced using advanced positron
manipulation techniques now being developed by FPSI.
beams can provide information about the composition, crystal structure and defect
characteristics of surfaces and solids. In particular, positron techniques
are unmatched in their ability to measure vacancy-type defects. This capability
is of great importance in measuring damage by ion implantation in semiconductors,
and in measuring the dielectric properties of low-k dielectric films being developed
for use in integrated circuits. Positron beams also have applications in basic
Click here for a detailed list of materials analysis applications.
Project Status: FPSI
currently developing a laboratory prototype, trap-based positron beam system.
The front end of the system became operational in January 2002 and the complete
systems will be operational by the end of 2002.
ACKNOWLEDGEMENT: This work was supported by the National Science Foundation (NSF) under Grant No DMI-0078468 and the Office of Naval Research (ONR) under contract No. N00014-00-C-0710. Any opinions, findings and conclusions or recommendations expressed in this material are those of FPSI and do not necessarily reflect the views of NSF or ONR.
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